In this work, the structural, thermal and optical properties of porous aluminum thin film carried out with various intensities of the anodization current in sulfuric acid. The obtained pores at the surface are filled by nanocrystalline silicon (nc-Si) thin films deposited by plasma enhancement chemical vapor deposition (PECVD), which the role is to improving its optical absorption and thermal properties. The prepared sample is an assembly of three different media such as Al sample/ Porous aluminum layer filled with silicon (PAS)/ nanocrystallite silicon layer (nc-Si). The effect of anodization current on the microstructure of porous aluminium and the effect of the deposited silicon layer were systematically studied by atomic force microscopy (AFM), X-ray diffraction (XRD) and Raman spectroscopy. The thermal properties such as the thermal conductivity (K) and thermal diffusivity (D) were determined by the photo-thermal deflection (PTD) technique, which is a non-destructive technique. Based on this full characterization, it is demonstrated that the thermal and optical characteristics of this films are directly correlated to their micro-structural properties.
Key words: Porous Aluminum; thermal conductivity; thermal diffusivity; gap energy
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