Abstract

The radical copolymerization of 2-(4-vinylphenyl)cyclopropylmethyl cinnamate with glycidyl methacrylate has been studied and new
cyclopropane- and epoxy-group containing photosensitive copolymers have been prepared. The relative activity of monomers and the
parameters of Q and e by Alfrey and Price method have been determined. The copolymerization constants of 2-(4-
vinylphenyl)cyclopropylmethyl cinnamate (r1) and glycidyl methacrylate (r2) were determined by the Fineman-Ross method and proved to
be r1 = 1.05 and r2 = 0.4, respectively; the parameters Q1 and e1 were found to be 1.82, -0.79, respectively. The composition and structure
of this copolymer have been established. The photochemical investigations of the synthesized copolymer have been carried out. It has been
established that during the photochemical transformation a re-structuring takes place due to cyclopropane and epoxide ring opening and
reaction of double bond in cinnamate fragment as well

Key words: microstructure; monomers; copolymerisation; 2-(4-vinylphenyl)cyclopropylmethyl cinnamate; photosensitivity